ACE LAB
ACS Applied Materials & Interfaces, 17(26), 38608-38618, 2025 (IF=8.5)
Oxidation-State-Dependent Selective Atomic Layer Etching of Metal OxidesㅤㅤㅤㅤㅤㅤㅤㅤㅤACS Applied Materials & Interfaces, 17(26), 38608-38618, 2025 (IF=8.5)
Chemical Engineering Journal, 514, 163280, 2025 (IF=13.4)
Atomic Layer Etching of High-k Oxide Thin Films Using Hexafluoroacetylacetone and Oxygen RadicalsChemical Engineering Journal, 514, 163280, 2025 (IF=13.4)
Nano Convergence, 12(1), 27, 2025 (IF=13.5)
Selective Metal Passivation by Vapor-Dosed Phosphonic Acid Inhibitors for Area-Selective Atomic Layer Deposition of SiO2 Thin FilmsNano Convergence, 12(1), 27, 2025 (IF=13.5)
Small Methods, 2402166, 2025 (IF=10.7)
Advanced Fabrication of Ultrathin Ruthenium Films Using Synergistic Atomic Layer Deposition and EtchingSmall Methods, 2402166, 2025 (IF=10.7)
ACS Applied Materials & Interfaces, 17(26), 38608-38618, 2025 (IF=8.5)
Oxidation-State-Dependent Selective Atomic Layer Etching of Metal OxidesㅤㅤㅤㅤㅤㅤㅤㅤㅤACS Applied Materials & Interfaces, 17(26), 38608-38618, 2025 (IF=8.5)
Chemical Engineering Journal, 514, 163280, 2025 (IF=13.4)
Atomic Layer Etching of High-k Oxide Thin Films Using Hexafluoroacetylacetone and Oxygen RadicalsChemical Engineering Journal, 514, 163280, 2025 (IF=13.4)
Nano Convergence, 12(1), 27, 2025 (IF=13.5)
Selective Metal Passivation by Vapor-Dosed Phosphonic Acid Inhibitors for Area-Selective Atomic Layer Deposition of SiO2 Thin FilmsNano Convergence, 12(1), 27, 2025 (IF=13.5)
Small Methods, 2402166, 2025 (IF=10.7)
Advanced Fabrication of Ultrathin Ruthenium Films Using Synergistic Atomic Layer Deposition and EtchingSmall Methods, 2402166, 2025 (IF=10.7)
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